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Thin Film Metal-Oxides : Fundamentals and Applications in Electronics and Energy / edited by Shriram Ramanathan

データ種別 電子ブック
著者標目 Ramanathan, Shriram editor
SpringerLink (Online service)
出版者 (Boston, MA : Springer US)
出版年 2010

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URL 図書館共通

EB007288
9781441906649 禁帯出

書誌詳細を非表示

巻次 ISBN:9781441906649
大きさ XVI, 337 p : online resource
一般注記 In Situ Synchrotron Characterization of Complex Oxide Heterostructures -- Metal-Insulator Transition in Thin Film Vanadium Dioxide -- Novel Magnetic Oxide Thin Films -- Bipolar Resistive Switching in Oxides for Memory Applications -- Complex Oxide Schottky Junctions -- Theory of Ferroelectricity and Size Effects in Thin Films -- High-T c Superconducting Thin- and Thick-Film–Based Coated Conductors for Energy Applications -- Mesostructured Thin Film Oxides -- Applications of Thin Film Oxides in Catalysis -- Design of Heterogeneous Catalysts and the Application to the Oxygen Reduction Reaction
Thin Film Metal-Oxides provides a representative account of the fundamental structure-property relations in oxide thin films. Functional properties of thin film oxides are discussed in the context of applications in emerging electronics and renewable energy technologies. Readers will find a detailed description of deposition and characterization of metal oxide thin films, theoretical treatment of select properties and their functional performance in solid state devices, from leading researchers. Scientists and engineers involved with oxide semiconductors, electronic materials and alternative energy will find Thin Film Metal-Oxides a useful reference.
HTTP:URL=http://dx.doi.org/10.1007/978-1-4419-0664-9
件 名 LCSH:Materials science
LCSH:Energy
LCSH:Electric power production
LCSH:Materials -- Surfaces  全ての件名で検索
LCSH:Thin films
FREE:Materials Science
FREE:Surfaces and Interfaces, Thin Films
FREE:Energy Technology
FREE:Energy, general
分 類 LCC:TA418.7-418.76
LCC:TA418.9.T45
DC23:620.44
書誌ID OB00007288
ISBN 9781441906649

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