The physics and chemistry of SiO[2] and the Si-SiO[2] interface 2 / edited by C. Robert Helms and Bruce E. Deal
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巻次 | ISBN:0306444194 |
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大きさ | xvi , 503p. ; 26cm |
本文言語 | 英語 |
一般注記 | Proceedings of the Second Symposium on the Physics and Chemistry of the SiO[2] and Si-SiO[2] Interface, held May 18-21, 1992, in St. Louis, Missouri, sponsored by the Electronics Division and the Dielectric Science and Technology Division of the Electrochemical Society Includes bibliographical references and index |
件 名 | LCSH:Silica -- Surfaces -- Congresses
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LCSH:Dielectrics -- Surfaces -- Congresses 全ての件名で検索 LCSH:Silicon dioxide films -- Congresses 全ての件名で検索 LCSH:Surface chemistry -- Congresses 全ての件名で検索 LCSH:Surfaces (Technology) -- Congresses 全ての件名で検索 |
分 類 | LCC:QC585.75.S55 DC20:546/.6832 |
書誌ID | 1000005634 |
ISBN | 0306444194 |
NCID | BA21102079 |